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SiAl (Silicon & Aluminum ) Rotary Sputtering Target
1.Detail:| Content | Si: 90 wt% ,Al:10 wt% |
| Purity | ≥99.95% |
| Relative Density | ≥96% |
| Resistivity | ≤10mΩ·cm |
| Specification | length(max)4000mm*thickness(max)13mm; linearity:05.mm |
| Processing Mode | Plasma spraying |
| Application | Low emission glass |
| Delivery time | 2 weeks after receipt of deposit |
2.Why Us :
| High purity | 99.9% |
| Uniform composition | element Deviation Index ±2wt% |
| Smaller grain | <100μm |
| High density | 2.251g/cm |
| Low resitivity | 7 mΩ·cm |
3: Our Target
Impurity Content:
Fe<=0.03% Cd<=0.0005% Pb<=0.0005% As<=0.0002%
Mn<=0.001% Cu<=0.0005% K<=0.001% Ca<=0.001%
4. Material molding method & finished product dimensional accuracy specifications:4.1 Manufacturing process: Plasma Spraying
4.2 Finished product dimensional accuracy according to the drawing tolerance of OMD provide shall prevail, and with money attached shipment report test data values.
5. Packaging:
5.1 The wooden case should be around 20 mm foam protection,.To ensure the transport process of target no bumps and so on.
5.2 With both internal and external packaging materials on the product label, volume label marked on the product name, product specifications, product, the net weight of products, product batch number and other information.
5.3 Suppliers need along with the cargo attached COA, inspection report to include on this batch size, purity, impurity content, the actual message.
FAQ--Please feel free to contact us ...
